Magnetron + Multi-arc Ion Plating Unit

ADV
This model is equipped with cylindrical targets or planar magnetron targets based on the multi-arc ion plating machine.
It has high ionization rate and high deposition rate of ion plating.
It also has the advantages of low temperature and stability of magnetron sputtering, which is suitable for plating various composite film layers, and can complete multiple composite film layers at one time.
It is equipped with DC pulse bias power supply (voltage and duty cycle are adjustable), inverter arc power supply, medium frequency power supply, etc.
The film layer has high bonding force, hardness and wear resistance coefficient.
The fully automatic control program is simple and flexible to operate, the process repeatability is accurate, labor cost is saved, the processing process is automatically stored, and the product quality is more stable.
The size of the coating unit can be customized, and various system devices can be selected according to different needs to provide solutions for the preparation of various high-performance film layers.