In modern advanced manufacturing, thin films not only need specific optical, electrical, or mechanical properties, but they must also be firmly "rooted" on the substrate surface. Otherwise, even the best functions will fail due to peeling, blistering, or
In modern materials science and surface engineering, thin-film technology has become a key tool for improving device performance and extending service life.
If the magnetic field is unevenly distributed, the plasma density will vary, resulting in different sputtering rates at different locations on the target surface and uneven thickness of the deposited film.
This article will explore how to optimize key parameters in a microwave ion source coating unit to increase ion density and energy, thereby improving the density of the coating.
The reaction gas flow rate needs to be adjusted jointly with parameters such as sputtering power, working gas pressure, and target-substrate distance.
The modular design allows for quick removal and replacement of key components such as the power supply, pump unit, and control panel, minimizing downtime.