The size, shape, and gas intake method of the vacuum chamber affect the diffusion and distribution of plasma.
This is the core equipment of the magnetron ion coating machine. With its high-energy plasma and precise ion control technology, it has become a "secret weapon" in modern industry for improving material performance, reshaping the fate of material surfaces
Maintenance and condition monitoring of magnetron ion coating machine equipment are fundamental to long-term arc suppression.
In the field of high-end thin film preparation, magnetron sputtering processes place extremely stringent requirements on equipment stability.
The innovative structure of the magnetron ion coating machine is a guarantee for improving the uniformity and stability of the coating.
The microwave ion source coating unit achieves precise control of the plasma state through the synergistic effect of microwave energy and magnetic fields, thereby optimizing the thin film growth kinetics at the atomic scale.