In the field of high-end thin film preparation, magnetron sputtering processes place extremely stringent requirements on equipment stability.
The innovative structure of the magnetron ion coating machine is a guarantee for improving the uniformity and stability of the coating.
The microwave ion source coating unit achieves precise control of the plasma state through the synergistic effect of microwave energy and magnetic fields, thereby optimizing the thin film growth kinetics at the atomic scale.
In modern advanced manufacturing, thin films not only need specific optical, electrical, or mechanical properties, but they must also be firmly "rooted" on the substrate surface. Otherwise, even the best functions will fail due to peeling, blistering, or
In modern materials science and surface engineering, thin-film technology has become a key tool for improving device performance and extending service life.
If the magnetic field is unevenly distributed, the plasma density will vary, resulting in different sputtering rates at different locations on the target surface and uneven thickness of the deposited film.